
Academic Journal
Q1Advanced Electronic Materials
About Advanced Electronic Materials
Advanced Electronic Materials is a scholarly journal published by John Wiley and Sons Inc. SCImago 2025 lists it in Q1, with an SJR of 1.333 and H-index of 116.
Coverage: 2015-2026. Research categories: Electronic, Optical and Magnetic Materials (Q1).
Open-access policies and author information
Reported in the official DOAJ public CSV snapshot (2026-09-01), downloaded 2026-10-03. Record updated 2026-03-17. This snapshot does not establish today’s listing status or fee quotation.
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Source-backed journal facts
Topics in published research
Advanced Memory and Neural Computing; Conducting polymers and applications; Advanced Sensor and Energy Harvesting Materials; Organic Electronics and Photovoltaics; 2D Materials and Applications; Ferroelectric and Negative Capacitance Devices.
OpenAlex classifies topics from published works. These topics are not the publisher’s official aims and scope.
Source: OpenAlex source record. Retrieved 2026-10-03. Source record updated 2026-10-02. OpenAlex metrics are different from SCImago metrics and the Clarivate Journal Impact Factor.
Journal Metrics
Quartile, SJR and the listed SCImago H-index use the 2025 imported SCImago dataset. A quartile may vary by subject category. Values without a source or reporting year are unverified historical entries. Verify the current Journal Impact Factor with Clarivate or the publisher before using it.
Aims & Scope
The publisher’s official aims and scope have not yet been verified for this profile. Use the journal website to check subject fit and accepted article types before submitting.
Recent Research Articles
Latest publications matched automatically by ISSN.
Facile One‐Pot Solvothermal Synthesis of Bi 2 Te 3 Nanoplate/Te Nanorod Composites with High Seebeck Coefficients for Flexible Film‐Based Thermoelectric Generators
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2026-10-02 · DOI: 10.1002/aelm.70595Colossal Modulation of Mechanical Resonance with temperature in single‐Crystalline SrTiO 3 Microbridges Integrated on Silicon
Deepa Guragain, Laveeza Ahmad, Alexander A. Puretzky, Carson Hester et al.
2026-09-29 · DOI: 10.1002/aelm.70601Experimental Evidence for the Impact of Copper Microstructure on Residual Stress of Through Silicon Via
Shuhang Lyu, Thomas Beechem, Tiwei Wei
2026-09-27 · DOI: 10.1002/aelm.70600Mn‐Substituted Topological Phase Transition in Topological Insulator Pt 2 HgSe 3
Deergh Bahadur Shahi, Gang Bahadur Acharya, Dipak Bhattarai, Bishnu Karki et al.
2026-09-27 · DOI: 10.1002/aelm.70588Flexible and Transparent Ga 2 O 3 /NiO Photovoltaic Diode for Full‐Wave Rectification in Wearable Optoelectronics
Sourov Hossain, Sanh Vo Thi, Md Arifur Rahman Barno, Seunghee Cho et al.
2026-09-27 · DOI: 10.1002/aelm.70587Novel Optical Functionalities in Memristors
Isabel Tenreiro, Víctor Rouco, Mariona Cabero, Henry Navarro et al.
2026-09-27 · DOI: 10.1002/aelm.202500771Decoupled Dielectric Optimization and YbO x Contact Engineering in All‐Spray‐Processed Oxide Thin‐Film Transistors
Ahmed Mohamed, Nathan R. Halcovitch, Oleg V. Kolosov, Arokia Nathan et al.
2026-09-27 · DOI: 10.1002/aelm.70598Impact of Rapid Thermal Annealing on the Structural and Piezoelectric Properties of AlN Thin Films
Laura Mazón‐Maldonado, Lucía Nieto Sierra, M. Pilar Villar Castro, Fernando Lloret‐Vieira et al.
2026-09-25 · DOI: 10.1002/aelm.70594Controllable Superconductivity in Suspended NbSe 2
Ruihuan Fang, Cuiju Yu, Youqiang Huang, Tosson Elalaily et al.
2026-09-24 · DOI: 10.1002/aelm.70592Stochastic‐MTJ Sampler Arrays for In‐Array Monte–Carlo Estimation
Ran Zhang, Nellie Laleni, Sina Ranjbar, Andreas Tsiougkos et al.
2026-09-23 · DOI: 10.1002/aelm.202600005Ultrahigh Detectivity Colloidal Quantum dot Avalanche Photodetectors Driven by Electron Mobility of the n‐Type Layer
Changjo Kim, Byeongsu Kim
2026-09-22 · DOI: 10.1002/aelm.70584A Compact Resistively Loaded Metamaterial Absorber for 2.4 GHz RF Energy Harvesting With Impedance‐Matched Rectifier Analysis
Md. Murad Kabir Nipun, Md. Jahedul Islam
2026-09-22 · DOI: 10.1002/aelm.70597Stable Magnetic Nanodomains Engineered Via Ga + ‐ion Irradiation For Deterministic Sequential Switching
Gijs W.A. Simons, Rik F.J. van Haren, Bert Koopmans
2026-09-22 · DOI: 10.1002/aelm.70585Improved Hole Transport Layer Surface by Carbazole Ammonium Treatment for 988 nm Near‐Infrared Tin‐Lead Perovskite LEDs
Jiale Chen, Jiaxiong Li, David Garcia Romero, Lijun Chen et al.
2026-09-17 · DOI: 10.1002/aelm.70566Predictable and Scalable Analog Matrix–Vector Multiplication in Memristor Crossbars via Closed‐Form Wire‐Resistance Compensation
Davide Rossetti, Yichun Xu, Ludovica Asselta, J. Joshua Yang et al.
2026-09-17 · DOI: 10.1002/aelm.70580Oxygen‐Scavenging‐Driven Interlayer Engineering for Balancing Linearity and Retention in IGZO Synaptic Memristors
Jae Woo Lee, Dong Hyeop Shin, Seung Joo Myoung, Soohong Eo et al.
2026-09-17 · DOI: 10.1002/aelm.70579Amorphous Tungsten Driving Extraordinary Long‐Range Interlayer Exchange Coupling and Large Spin‐Orbit Torque
Xueyao Hou, Keita Ito, Varun K. Kushwaha, Takumi Yamazaki et al.
2026-09-16 · DOI: 10.1002/aelm.70545Core and π‐Bridge Engineering to Deconstruct Y6‐Series into Modular Non‐Fused Acceptors: DFT‐Guided Structure‐Property Map for Organic Solar Cells
Qurat ul Ain, Waqas Akram, Hasan Yaqoob, Munazza Shahid et al.
2026-09-14 · DOI: 10.1002/aelm.70572Nonlinear Dynamics and Invariants of Motion in ReRAM Cells
Mauro Di Marco, Mauro Forti, Luca Pancioni, Giacomo Innocenti et al.
2026-09-14 · DOI: 10.1002/aelm.70553A Full Physical Strategy for Electrical Contacts on Laser‐Induced Graphene (LIG) Electrodes
Davide Arcoraci, Simone Martellone, Michele Miceli, Davide Molino et al.
2026-09-14 · DOI: 10.1002/aelm.70576Reviews
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September 25, 2026 at 7:35 am
September 25, 2026