Academic Journal
Q3Journal of Photopolymer Science and Technology
About Journal of Photopolymer Science and Technology
Journal of Photopolymer Science and Technology is a scholarly journal published by Tokai University. SCImago 2025 lists it in Q3, with an SJR of 0.25 and H-index of 44.
Coverage: 1988-2025. Research categories: Materials Chemistry (Q3); Polymers and Plastics (Q3); Organic Chemistry (Q4).
Source-backed journal facts
Topics in published research
Advancements in Photolithography Techniques; Nanofabrication and Lithography Techniques; Synthesis and properties of polymers; Photopolymerization techniques and applications; Silicone and Siloxane Chemistry; Integrated Circuits and Semiconductor Failure Analysis.
OpenAlex classifies topics from published works. These topics are not the publisher’s official aims and scope.
Source: OpenAlex source record. Retrieved 2026-10-03. Source record updated 2026-10-02. OpenAlex metrics are different from SCImago metrics and the Clarivate Journal Impact Factor.
Journal Metrics
Quartile, SJR and the listed SCImago H-index use the 2025 imported SCImago dataset. A quartile may vary by subject category. Values without a source or reporting year are unverified historical entries. Verify the current Journal Impact Factor with Clarivate or the publisher before using it.
Aims & Scope
The publisher’s official aims and scope have not yet been verified for this profile. Use the journal website to check subject fit and accepted article types before submitting.
Recent Research Articles
Latest publications matched automatically by ISSN.
Effect of Methyl Group of Terminal Phenol of Dissolution Inhibitor on Sensitivity in Chemically Amplified Three-Component Novolac Resists
Katsuaki Takashima, Hidekazu Konishi, Yuichirou Tanaka, Hideo Horibe et al.
2026-07-31 · DOI: 10.2494/photopolymer.39.137Dissolution Kinetics of Poly(4-hydroxystyrene) Film in Alcohol/water Mixture -Development Simulation of Polymer Films Using Intrinsic Viscosity and Huggins Coefficient-
Mikiko Kozawa, Yuko Tsutsui Ito, Kayoko Cho, Yuqing Jin et al.
2026-07-31 · DOI: 10.2494/photopolymer.39.91Improvement of Non-PFAS Biomass EUV Resist by Optimization of Chemical Structures
Sotaro Fukumoto, Yuki Yoshikura, Yuki Yanagisawa, Harumi Sunaga et al.
2026-07-31 · DOI: 10.2494/photopolymer.39.159Moth-eye nanostructured surface with patterned superhydrophilic regions on a superhydrophobic background
Takuto Wakasa, Jun Taniguchi
2026-07-31 · DOI: 10.2494/photopolymer.39.189Influence of Underlayer Material Parameters on Pattern Collapse in EUV Patterning
Hyeon Woo Shin, Stanfield Youngwon Lee, Jiyoung Hwang, Jin Hong Park et al.
2026-07-31 · DOI: 10.2494/photopolymer.39.85Study of the High-intensity Reflection Structure that used the Speckle Exposure Method
Atsushi Sekiguchi, Tomoki Iwaoka, Hiroshi Kobayashi, Toshiyuki Horiuchi et al.
2026-07-31 · DOI: 10.2494/photopolymer.39.263Patterning Materials for Lithography: Moving in New Directions
Harry J. Levinson
2026-07-31 · DOI: 10.2494/photopolymer.39.29Development of Reactive Molecular Dynamics for Cross-linked Polymer Networks
Minoru Hoshino, Masaru Yamasaki, Yohei Okoda, Ryohei Kondo et al.
2026-07-31 · DOI: 10.2494/photopolymer.39.277Engineering the Future of EUV Lithography: A Collaborative Journey in Metal-Oxide Resist Innovation
Danilo De Simone
2026-07-31 · DOI: 10.2494/photopolymer.39.67Observation of Crystal-to-Liquid and Liquid-to-Solid Phase Transitions of Azobenzene Crystals in Response to Light Wavelengths
Mina Han
2026-07-31 · DOI: 10.2494/photopolymer.39.271Droplet-confined Multi-material Microprinting via Two-photon Polymerization: Resin Formulation and Processability Windows
Tengyu Li, Yoshihiro Taguchi
2026-07-31 · DOI: 10.2494/photopolymer.39.15An Efficient Approach to Compare Acid Diffusive Ability in DUV Resists Under Open Frame Exposure
Ruiwen Ai, Liang Xu, Xingang Pan
2026-07-31 · DOI: 10.2494/photopolymer.39.225Improvements of Applying RAFT Polymerization in High-performance Photoresist Manufacture
Xiang Dong, Xingang Pan
2026-07-31 · DOI: 10.2494/photopolymer.39.249Light- and Heat-Triggered Degradation of Dual-Stimuli-Responsive Polymer Brushes Generating Bubbles with a Photoacid Generator
Haruyuki Okamura, Urara Nogawa, Tomoya Kanao, Kohji Ohno et al.
2026-07-31 · DOI: 10.2494/photopolymer.39.131Formation Kinetics of Polymer Films Probed by Aggregation-Induced Emissive Molecules
Hinata Tamada, Hyung Do Kim, Shunsuke Yamamoto, Hideo Ohkita et al.
2026-07-31 · DOI: 10.2494/photopolymer.39.291Etching and Surface Modification of Organic Films by Atomic Hydrogen Annealing
Akira Heya, Yuto Fujino, Koji Sumitomo
2026-07-31 · DOI: 10.2494/photopolymer.39.123Hydro- and Oleophobic Properties of Neanurinae (Collembola)
Satoru Tachibana, Seiya Nishikawa, Takeshi Ito
2026-07-31 · DOI: 10.2494/photopolymer.39.185Measurement and Control of the Isoelectric Point of DLC Films Deposited on the Inner Surfaces of Tubes via the Streaming Potential Method
Shinsuke Kunitsugu, Tatsuyuki Nakatani, Yuichi Imai
2026-07-31 · DOI: 10.2494/photopolymer.39.45Surface Modification of Polystyrene Substrates <i>via</i> Non-thermal Atmospheric Pressure Plasma Treatment for Controlling Cell Adhesion
Naoki Doi, Kyosuke Miyagawa, Yukinori Yamauchi, Yasushi Sasai et al.
2026-07-31 · DOI: 10.2494/photopolymer.39.109Ultrasound-Assisted Degradation of Stimuli-Sensitive Polymers which Generate Bubbles: Effect of Polymer Structure
Haruyuki Okamura, Keisuke Oshima, Kohji Ohno, Kentaro Taki et al.
2026-07-31 · DOI: 10.2494/photopolymer.39.99Reviews
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October 4, 2026 at 9:34 pm
October 2, 2026