Academic Journal
Q2Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
About Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films is a scholarly journal published by AVS Science and Technology Society. SCImago 2025 lists it in Q2, with an SJR of 0.431 and H-index of 131.
Coverage: 1970, 1982-2026. Research categories: Condensed Matter Physics (Q2); Surfaces, Coatings and Films (Q2); Surfaces and Interfaces (Q3).
Source-backed journal facts
Topics in published research
Semiconductor materials and devices; Metal and Thin Film Mechanics; Plasma Diagnostics and Applications; Ion-surface interactions and analysis; Diamond and Carbon-based Materials Research; Electron and X-Ray Spectroscopy Techniques.
OpenAlex classifies topics from published works. These topics are not the publisher’s official aims and scope.
Source: OpenAlex source record. Retrieved 2026-10-03. Source record updated 2026-10-02. OpenAlex metrics are different from SCImago metrics and the Clarivate Journal Impact Factor.
Journal Metrics
Quartile, SJR and the listed SCImago H-index use the 2025 imported SCImago dataset. A quartile may vary by subject category. Values without a source or reporting year are unverified historical entries. Verify the current Journal Impact Factor with Clarivate or the publisher before using it.
Aims & Scope
The publisher’s official aims and scope have not yet been verified for this profile. Use the journal website to check subject fit and accepted article types before submitting.
Recent Research Articles
Latest publications matched automatically by ISSN.
Coatings from recycled poly(ethylene terephthalate)-based unsaturated polyester resin with sol-gel modification for hydraulic concrete: Wettability, adhesion, and barrier performance
A. Bórquez-Mendivil, J. E. Leal-Perez, F. Espejel-Ayala, C. P. Barrios-Durstewitz et al.
2026-12-01 · DOI: 10.1116/6.0005571Optimization of thickness uniformity in large area coatings using ion assisted electron beam evaporation: Numerical and experimental investigation
Faiyaz Mollick, Maheswar Nayak, Jitendra Kumar, Ajay Kumar Kashyap et al.
2026-12-01 · DOI: 10.1116/6.0005740Selective Cu native oxide removal via in situ N2 plasma and ultrathin SiN capping: A stable alternative to wet chemical and Ar plasma treatments
Kinga Kondracka, Cyrille Sébert, Patrick Verdonck, Kristof Wouters et al.
2026-12-01 · DOI: 10.1116/6.0005656Quantitative model of sidewall redeposition and cleaning in ion beam etching for semiconductor device fabrication
Jie Li
2026-12-01 · DOI: 10.1116/6.0005514Impact of COF2 dry cleaning on the physicochemical properties of plasma enhanced chemical vapor deposited SiO2 thin films
Chae Woon Kim, Sang Jeen Hong
2026-12-01 · DOI: 10.1116/6.0005628Plasma etching behavior of iridium in CF4- and Cl2-based chemistries
Yanan Li, Leila Ghorbani, Philippe Bezard, Shreya Kundu et al.
2026-12-01 · DOI: 10.1116/6.0005622Fine-tuning a universal machine-learned interatomic potential for oxygen plasma interactions with WS2
Jaehong Kwon, Andrew S. Rosen, David B. Graves
2026-12-01 · DOI: 10.1116/6.0005737Area selective atomic layer deposition of ruthenium with pinacolborane as a small molecule inhibitor
Sundas Ismaeel, Heta-Elisa Nieminen, Mykhailo Chundak, Mikko Ritala et al.
2026-12-01 · DOI: 10.1116/6.0005690Block method: Reference-anchored peak fitting for tracking subtle chemical evolution in sequential XPS spectra
Abraham Jorge Carmona-Carmona, Orlando Cortazar-Martinez, Jorge Adalberto Huerta-Ruelas, Mariela Bravo-Sanchez et al.
2026-12-01 · DOI: 10.1116/6.0005752Highly sensitive hydrogen detection at low ppm levels using Pd70Ag30 alloy thin films: Role of structural evolution probed by in situ synchrotron XRD
Avantika Chauhan, Durvesh Gautam, Yogendra K. Gautam, Arka Bikash Dey et al.
2026-12-01 · DOI: 10.1116/6.0005570On the Cl2 plasma etching mechanisms of AlN micropillars: Carrier wafer impact
Saron Sales de Mello, Lucas Jaloustre, Sébastien Labau, Mohammed Irar et al.
2026-12-01 · DOI: 10.1116/6.0005683Optimizing the bromide incorporation in mixed-halide Cs x FA1− x Pb(I1− y Br y )3 perovskites for improving solar cell performance
D. Mateus Torres-Herrera, Rosa Nava-Sánchez, Arturo Morales-Acevedo
2026-12-01 · DOI: 10.1116/6.0005536Phase formation and thermal stability of superconducting platinum silicide thin films on silicon
Tharanga R. Nanayakkara, Ananya Chattaraj, Mingzhao Liu, Charles T. Black et al.
2026-12-01 · DOI: 10.1116/6.0005644Unprecedented high-impact solid particle erosion of borided Inconel 718: Surface degradation and statistical damage assessment
A. Hernández-Ruiz, A. M. Delgado-Brito, K. D. Chaparro-Pérez, U. Figueroa-López et al.
2026-12-01 · DOI: 10.1116/6.0005637Understanding sidewall passivation composition of single-step non-Bosch processes for deep Si etch using alternative gas mixtures
Richa Agrawal, Nathan Marchack, Rosa Goss, Marinus Hopstaken et al.
2026-12-01 · DOI: 10.1116/6.0005520Selective physisorption ALD-like process and selective PECVD process for smoothing metal organic resist using SO2
Nicolas Maldonado, Van-Long Nguyen, Christophe Vallee, Gregory Denbeaux et al.
2026-09-01 · DOI: 10.1116/6.0005554Effect of x-ray exposure on the rate of decomposition of anodic gold oxide
Zahed Ghelichkhah, Ryan Thorpe, Gregory S. Ferguson
2026-09-01 · DOI: 10.1116/6.0005751Integrating area-selective catalytic PMMA etching with PMMA-inhibited area-selective deposition of HfO2
Enzo Novoselic, Natalya Tokranova, Christophe Vallée
2026-09-01 · DOI: 10.1116/6.0005630Inductively coupled plasma driven by asymmetric triangular current waveform
Shahid Rauf, Tianhong Wang, Jason Kenney, Dmytro Sydorenko et al.
2026-09-01 · DOI: 10.1116/6.0005607Fast-neutron irradiation response of β-Ga2O3 Schottky barrier diodes on sapphire substrate
Saleh Ahmed Khan, Ahmed Ibreljic, Sourav Sarker, Stephen Margiotta et al.
2026-09-01 · DOI: 10.1116/6.0005604Reviews
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October 4, 2026 at 9:22 pm
October 2, 2026