Academic Journal
Q2Micro and Nano Engineering
About Micro and Nano Engineering
Micro and Nano Engineering is a scholarly journal published by Elsevier B.V.. SCImago 2025 lists it in Q2, with an SJR of 0.651 and H-index of 22.
Coverage: 2018-2026. Research categories: Atomic and Molecular Physics, and Optics (Q2); Condensed Matter Physics (Q2); Electrical and Electronic Engineering (Q2); Electronic, Optical and Magnetic Materials (Q2); Surfaces, Coatings and Films (Q2).
Open-access policies and author information
Reported in the official DOAJ public CSV snapshot (2026-09-01), downloaded 2026-10-03. Record updated 2026-01-13. This snapshot does not establish today’s listing status or fee quotation.
Publisher policy links recorded by DOAJ
- Aims and scope ↗
- Editorial board ↗
- Instructions for authors ↗
- Peer-review policy ↗
- Publication fees ↗
- Fee waivers ↗
- Licence terms ↗
- Copyright policy ↗
- Preservation policy ↗
Source: DOAJ journal record. Journal metadata is distributed by DOAJ under CC0. Confirm current fees, tax, eligibility and waiver terms with the publisher.
Source-backed journal facts
Topics in published research
Nanofabrication and Lithography Techniques; Advanced Sensor and Energy Harvesting Materials; Advancements in Photolithography Techniques; Semiconductor materials and devices; Microfluidic and Capillary Electrophoresis Applications; Force Microscopy Techniques and Applications.
OpenAlex classifies topics from published works. These topics are not the publisher’s official aims and scope.
Source: OpenAlex source record. Retrieved 2026-10-03. Source record updated 2026-10-02. OpenAlex metrics are different from SCImago metrics and the Clarivate Journal Impact Factor.
Journal Metrics
Quartile, SJR and the listed SCImago H-index use the 2025 imported SCImago dataset. A quartile may vary by subject category. Values without a source or reporting year are unverified historical entries. Verify the current Journal Impact Factor with Clarivate or the publisher before using it.
Aims & Scope
The publisher’s official aims and scope have not yet been verified for this profile. Use the journal website to check subject fit and accepted article types before submitting.
Recent Research Articles
Latest publications matched automatically by ISSN.
Effect of PEDOT channel thickness on ionic concentration discrimination in organic electrochemical transistors
Noemi Cesario, Martina Paraggio, Natalia Malara, Nicola Coppedé et al.
2026-12 · DOI: 10.1016/j.mne.2026.100400All-dry stencil patterning of IGZO thin films with micrometer-scale resolution and electrical validation
Chenxiang Zhang, Mounir Driss Mensi, Giovanni Boero, Arnaud Bertsch et al.
2026-12 · DOI: 10.1016/j.mne.2026.100397Geometry-tuned inertial microfluidics for label-free enrichment of CTC-sized cells in serpentine microchannels
Ünal Akar, Ramazan Ceylan, Ayşegül Açıksarı, Ezgi Kestek et al.
2026-12 · DOI: 10.1016/j.mne.2026.100396Plasma-induced roughening of inclined polymeric surfaces: Morphological analysis and assessment
Athina S. Kastania, Sotiris Mouchtouris, Eleni Stai, Vassiliοs Constantoudis et al.
2026-12 · DOI: 10.1016/j.mne.2026.100393Electrical performance of the perovskite solar cells with 3D patterned layers
Mariya Aleksandrova, Tsvetozar Tsanev, Rade Tomov, Yordan Paunov et al.
2026-09 · DOI: 10.1016/j.mne.2026.100385Quantifying reduced negative ion contributions in nano-confined SiO2 wet etching via reaction-pathway analysis
Dai Ueda, Akiko Harumoto
2026-09 · DOI: 10.1016/j.mne.2026.100376Recent advances in adapting ionic liquid ion sources to focused ion beams technologies
Philippe Berdagué, Philippe Lesot, David Bouville, Cédric Villebasse et al.
2026-09 · DOI: 10.1016/j.mne.2026.100389ArF grayscale lithography for high-volume manufacturing of submicron 3D structures
Gaby BÉLOT, Sébastien BÉRARD-BERGERY, Élodie SUNGAUER, Aurélien FAY et al.
2026-09 · DOI: 10.1016/j.mne.2026.100375Top-down fabrication of TiN nanogap electrodes via lithographic patterning and plasma-assisted dimensional transfer
Saadman Abedin, Peggy Reich, Jörn Pezoldt, Katharina Freiberg et al.
2026-09 · DOI: 10.1016/j.mne.2026.100401Selective Laser Etching technology for reconfigurable microfluidic and electrochemistry-on-chip
Inès Muguet, David Bourrier, Pierre-François Calmon, Pierre Lapèze et al.
2026-09 · DOI: 10.1016/j.mne.2026.100384Design and feasibility of strain FET based on TMD heterostructure
Nigama Vajjula, Fitunerediate G. Gebeyehu, Youngsang Ko, Yeonwoong Jung et al.
2026-09 · DOI: 10.1016/j.mne.2026.100395Optimization of hydrogen silsesquioxane planarization for multilayer photonic platforms
Sarra Salhi, Jian Cao, Jean-Rene Coudevylle, François Maillard et al.
2026-09 · DOI: 10.1016/j.mne.2026.100379Mitigating the degradation of metal–semiconductor contacts with optimized electron beam evaporation
Thorben Frahm, Patrick Liebisch, Jochen Heiß, Sven Ingebrandt et al.
2026-09 · DOI: 10.1016/j.mne.2026.100368Fabrication of planar full-SiC-based nanostructured multi-electrode arrays (MEA) for neural interfaces
Fabrice Iacovella, Scott Greenhorn, Gwenaelle Pound-Lana, Lucas Labbe et al.
2026-09 · DOI: 10.1016/j.mne.2026.100391A review of plasmonic wave generation: Materials, AI-based design approaches, and applications
Reena Narasimhan, Malathi Murugesan
2026-09 · DOI: 10.1016/j.mne.2026.100372A P(VDF-TrFE)/AlN nanocomposite with high filler content: Towards a “hard ferroelectric soft material” with enhanced properties for additive printing
Wolfgang Hilber, Sebastian Lang, Bernhard Jakoby
2026-09 · DOI: 10.1016/j.mne.2026.100374An enhanced print-pause-print strategy for modular stereolithography microfluidics with embedded optical access and functional integration
Alexandra Rolland, Aline Cerf, Christophe Vieu, Hervé Aubert et al.
2026-09 · DOI: 10.1016/j.mne.2026.100378Planar Zn metasurfaces formed through localized O2 plasma treatment for optically transparent RF shielding
Thomas M. Howe, Kai Sun, Otto L. Muskens, C.H. (Kees) de Groot et al.
2026-09 · DOI: 10.1016/j.mne.2026.100392Exploiting the interaction area limitation in Electrostatic Force Microscopy for dielectric measurements of nanoparticles
Lukas Lehnert, Lars Helgest, Benjamin Baumann, Anna Musyanovych et al.
2026-09 · DOI: 10.1016/j.mne.2026.100394Annealing effects on effective Young’s modulus of Ti/Au multi-layered microcantilevers
Tatsuhiko Mori, Tomoyuki Kurioka, Shunkai Watanabe, Chun-Yi Chen et al.
2026-09 · DOI: 10.1016/j.mne.2026.100367Reviews
Community Reviews
Version History
October 4, 2026 at 9:11 pm
October 2, 2026