
Academic Journal
Q2Nanotechnology and Precision Engineering
About Nanotechnology and Precision Engineering
Nanotechnology and Precision Engineering is a scholarly journal published by American Institute of Physics. SCImago 2025 lists it in Q2, with an SJR of 0.448 and H-index of 27.
Coverage: 2006-2026. Research categories: Electrical and Electronic Engineering (Q2); Industrial and Manufacturing Engineering (Q2); Instrumentation (Q2); Mechanical Engineering (Q2); Nanoscience and Nanotechnology (Q3).
Open-access policies and author information
Reported in the official DOAJ public CSV snapshot (2026-09-01), downloaded 2026-10-03. Record updated 2021-04-13. This snapshot does not establish today’s listing status or fee quotation.
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Source: DOAJ journal record. Journal metadata is distributed by DOAJ under CC0. Confirm current fees, tax, eligibility and waiver terms with the publisher.
Source-backed journal facts
Topics in published research
Advanced Surface Polishing Techniques; Advanced MEMS and NEMS Technologies; Advanced Measurement and Metrology Techniques; Advanced machining processes and optimization; Force Microscopy Techniques and Applications; Piezoelectric Actuators and Control.
OpenAlex classifies topics from published works. These topics are not the publisher’s official aims and scope.
Source: OpenAlex source record. Retrieved 2026-10-03. Source record updated 2026-10-02. OpenAlex metrics are different from SCImago metrics and the Clarivate Journal Impact Factor.
Journal Metrics
Quartile, SJR and the listed SCImago H-index use the 2025 imported SCImago dataset. A quartile may vary by subject category. Values without a source or reporting year are unverified historical entries. Verify the current Journal Impact Factor with Clarivate or the publisher before using it.
Aims & Scope
The publisher’s official aims and scope have not yet been verified for this profile. Use the journal website to check subject fit and accepted article types before submitting.
Recent Research Articles
Latest publications matched automatically by ISSN.
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2027-06-01 · DOI: 10.1063/5.0330702Taming the boundary effect: Femtosecond laser slicing of 4H-SiC enabled by side scribing for improved processability
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2027-03-01 · DOI: 10.1063/5.0326538A hierarchical scheduling strategy for achieving multi-source energy complementarity in self-powered systems
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2027-03-01 · DOI: 10.1063/5.0332039A simulation model of atomic force microscope and its guidance for scanning surfaces with multi-material properties
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2027-03-01 · DOI: 10.1063/5.0320964A micro-interdigitated array electrode-based microfluidic chip for the online detection of Hg(II)
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2027-03-01 · DOI: 10.1063/5.0332520Optimizing dynamic pulsing characteristics for highly sensitive and energy-efficient MEMS hydrogen sensors
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2027-03-01 · DOI: 10.1063/5.0338802Magnetic field optimization and output characteristic analysis of macro–micro precision actuator based on grey wolf optimizer
Tian Xie, Qian Tao, Kun Zhang, Xuan Peng et al.
2027-03-01 · DOI: 10.1063/5.0323342Enhancing capillary performance of aluminum alloy micro-grooved miniature heat pipes using a novel self-sealing hydrothermal process
Yongda Liu, Ziyang Wang, Xiaoliang Wang, Debin Shan et al.
2026-12-01 · DOI: 10.1063/5.0304258Microelectrode array-based detection and modulation of sleep–wake neuroinformation in the mouse preoptic area
Yiming Duan, Qianli Jia, Jinping Luo, Yu Wang et al.
2026-12-01 · DOI: 10.1063/5.0328124On-machine dressing of cup-shaped diamond grinding wheels for high-quality hemispherical resonator manufacturing
Junhan Liu, Shayu Song, Shanyi Ma, Yu Jia et al.
2026-12-01 · DOI: 10.1063/5.0322186A backflow-suppressing piezoelectric MEMS cooler for thermal management within confined spaces
Mingchao Sun, Menglun Zhang, Xinhao Wang, Shaobo Gong et al.
2026-12-01 · DOI: 10.1063/5.0336201A modified adaptive disturbance observer-based sliding mode control for piezoelectric actuator-driven nanopositioning system with enhanced disturbance rejection
Zihao Pan, Hui Tang, Chengsi Huang, Zhishen Liao et al.
2026-12-01 · DOI: 10.1063/5.0326193A deflection distortion correction method for high-speed electron-beam lithography
Zhengjie Li, Bohua Yin, Zhixuan Pan, Jingyu Huang et al.
2026-12-01 · DOI: 10.1063/5.0316132Reviews
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October 4, 2026 at 9:21 pm
October 2, 2026